The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2013

Filed:

Apr. 27, 2009
Applicants:

Raghupathy Sivakumar, Alpharetta, GA (US);

Aravind Velayutham, Atlanta, GA (US);

Zhenyun Zhuang, Atlanta, GA (US);

Inventors:

Raghupathy Sivakumar, Alpharetta, GA (US);

Aravind Velayutham, Atlanta, GA (US);

Zhenyun Zhuang, Atlanta, GA (US);

Assignee:

EMC Corporation, Hopkington, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 15/173 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are methods and systems for creating an optimal set of reflector peers, comprising detecting a plurality of reflector peers, retrieving a plurality of static metrics from each of the plurality of reflector peers, ranking the plurality of reflector peers based on the plurality of static metrics, selecting a top predetermined number of peers from each static metric, establishing the selected reflector peers as the optimal set of reflector peers, determining dynamic metric for each of the plurality of reflector peers, and adjusting the optimal set of reflector peers based on the dynamic metric.


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