The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Oct. 29, 2010
Bruno Kristiaan Bernard DE Man, Clifton Park, NY (US);
Jiang Hsieh, Brookfield, WI (US);
Naveen Chandra, Kenosha, WI (US);
Jed Douglas Pack, Glenville, NY (US);
Jiahua Fan, New Berlin, WI (US);
Bruno Kristiaan Bernard De Man, Clifton Park, NY (US);
Jiang Hsieh, Brookfield, WI (US);
Naveen Chandra, Kenosha, WI (US);
Jed Douglas Pack, Glenville, NY (US);
Jiahua Fan, New Berlin, WI (US);
General Electric Company, Schenectady, NY (US);
Abstract
A system and method for material decomposition optimization in the image domain include a non-transitory computer readable medium has stored thereon a sequence of instructions which, when executed by a computer, causes the computer to access a reconstructed basis material image. For a first voxel of the reconstructed basis material image, the instructions also cause the computer to optimize a concentration of a pair of materials (a,b) in the first voxel exclusively in the image domain and based on a first probability based on random perturbations and a second probability based on random perturbations. The optimization is further based on a third probability based on known materials and a fourth probability based on concentrations of the pair of materials in a pair of voxels neighboring the first voxel.