The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Dec. 16, 2009
Yun Zou, Clifton Park, NY (US);
Peter Andras Zavodszky, Clifton Park, NY (US);
Mark E. Vermilyea, Niskayuna, NY (US);
Sergio Lemaitre, Whitefish Bay, WI (US);
Mark Alan Frontera, Ballston Lake, NY (US);
Yun Zou, Clifton Park, NY (US);
Peter Andras Zavodszky, Clifton Park, NY (US);
Mark E. Vermilyea, Niskayuna, NY (US);
Sergio Lemaitre, Whitefish Bay, WI (US);
Mark Alan Frontera, Ballston Lake, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
An apparatus for modifying an aspect ratio of an electron beam to form a focal spot having a desired size and aspect ratio on a target anode is disclosed. The apparatus includes an emitter element configured to generate an electron beam having a first aspect ratio shape and an extraction electrode positioned adjacent to the emitter element to extract the electron beam out therefrom, the extraction electrode including an opening therethrough. The apparatus also includes at least one shaping electrode positioned to receive the electron beam after passing through the extraction electrode, the shaping electrode defining a non-circular aperture therein and being configured to provide at least one of shaping and focusing of the electron beam to have a second aspect ratio shape different from the first aspect ratio shape so as to form a focal spot having a desired size and aspect ratio on a target anode.