The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Aug. 03, 2004
Fusashi Nakamura, Tokyo-to, JP;
Fusashi Nakamura, Tokyo-to, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Device for generating a hologram pattern including: selecting means for selecting, as cross section ranges which are in a plurality of cross sections parallel to hologram pattern in 3D object and which are ranges used for generating hologram pattern, cross section ranges which overlap ranges in other cross sections when the relevant cross section is perspectively seen from a predetermined observation point on the hologram pattern; depth integrating means for calculating, for lattice points in one cross section range, a depth integral function acquired by integrating an inverse diffraction function for determining hologram pattern for displaying points of 3D object with respect to respective lattice points in the cross section ranges which overlap the relevant lattice point; and inverse Fourier transform means for generating hologram pattern by performing two-dimensional inverse transform on depth integral functions with respect to plurality of lattice points in one cross section range.