The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Aug. 29, 2008
Peter F. Falco, Jr., Saratoga, CA (US);
Gavin S. P. Miller, Los Altos, CA (US);
Michael O. Clifton, Scotts Valley, CA (US);
Nathan A. Carr, San Jose, CA (US);
Nikolai Svakhin, San Jose, CA (US);
Aravind Krishnaswamy, San Jose, CA (US);
Peter F. Falco, Jr., Saratoga, CA (US);
Gavin S. P. Miller, Los Altos, CA (US);
Michael O. Clifton, Scotts Valley, CA (US);
Nathan A. Carr, San Jose, CA (US);
Nikolai Svakhin, San Jose, CA (US);
Aravind Krishnaswamy, San Jose, CA (US);
Adobe Systems Incorporated, San Jose, CA (US);
Abstract
A method, system, and computer-readable storage medium are disclosed for distortion-based mask generation. A respective distortion metric may be determined at each location of a plurality of locations in a two-dimensional representation of a three-dimensional object. The two-dimensional representation may be based on a view of the three-dimensional object. Each respective distortion metric may indicate a degree of distortion in a mapping between the respective location in the two-dimensional representation and a corresponding location in a surface texture of the three-dimensional object. The visual representation of the respective distortion metric at one or more of the plurality of locations may be displayed.