The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Jan. 14, 2011
Applicant:
Christopher W. Peters, Cherry Hill, NJ (US);
Inventor:
Christopher W. Peters, Cherry Hill, NJ (US);
Assignee:
Lockheed Martin Corporation, Bethesda, MD (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for determining the seam location for each layer of a multilayer radome for use with an array antenna includes the steps of quantizing the radome thickness, and forming an image of the quantized thickness vs. line array position. Seam locations are assigned for an original population, and a genetic algorithm is iterated to optimize a cost function. The cost function is the level of all sidelobes other than the main lobe. The result of the genetic algorithm is an optimized set of seam locations. The radome is built with the seam locations corresponding to the optimized locations.