The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2013

Filed:

Jul. 26, 2012
Applicant:

Kazukiyo Joshin, Atsugi, JP;

Inventor:

Kazukiyo Joshin, Atsugi, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0256 (2006.01); H01L 31/0328 (2006.01); H01L 31/0336 (2006.01); H01L 31/072 (2012.01); H01L 31/109 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device includes: an electron-transit layer made of a semiconductor, the electron-transit layer having a first band gap; an electron-supply layer disposed on the electron-transit layer, the electron-supply layer being made of a semiconductor having a second band gap that is wider than the first band gap; a barrier-forming layer disposed on the electron-supply layer, the barrier-forming layer being made of a semiconductor having a third band gap that is narrower than the second band gap; an upper-channel layer disposed on the barrier-forming layer, the upper-channel layer being made of a semiconductor doped with an impurity; a side-surface of the barrier-forming layer and the upper-channel layer formed by partly removing the barrier-forming layer and the upper-channel layer; an insulating-film disposed on the side-surface; a gate-electrode disposed on the insulating-film; a source-electrode connected to the upper-channel layer; and a drain-electrode connected to the electron-supply layer or the electron-transit layer.


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