The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2013

Filed:

Aug. 23, 2011
Applicants:

David C. Martin, Lincoln University, PA (US);

Kathleen E. Feldman, Wilmington, DE (US);

Inventors:

David C. Martin, Lincoln University, PA (US);

Kathleen E. Feldman, Wilmington, DE (US);

Assignee:

University of Delaware, Newark, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 75/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Substituted 3,4-propylenedioxythiophene monomers may be prepared by reacting 3-allyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine or 3,3-diallyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine with a thiol having a hydrocarbyl moiety optionally containing one or more heteroatom-containing functional groups under radical addition conditions under radical addition conditions. Such monomers may be used in homo- or copolymerization processes to obtain thiophene-type polymers containing substituents (which may bear functional groups such as silane, thiol, hydroxyl, carboxylic acid, amine, sugar groups, polyoxyalkylene, and the like). Crosslinkers useful for introducing crosslinking into thiophene-type polymers may be prepared by reacting 3-allyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine with a compound having two or more thiol groups under radical addition conditions.


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