The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Dec. 17, 2010
Applicants:
Atsuro Yoneda, Osaka, JP;
Akiko Hemmi, Osaka, JP;
Sachiko Nakanishi, Osaka, JP;
Daisuke Michitaka, Osaka, JP;
Inventors:
Atsuro Yoneda, Osaka, JP;
Akiko Hemmi, Osaka, JP;
Sachiko Nakanishi, Osaka, JP;
Daisuke Michitaka, Osaka, JP;
Assignee:
Nippon Shokubai Co., Ltd., Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08F 216/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention has an object to provide a polyalkylene glycol-based polymer having high anti-soil redeposition ability in washing treatment and having high compatibility with surfactants. The polyalkylene glycol-based polymer includes: a structure unit (a) derived from a polyalkylene glycol-based monomer (A) of a specific structure, and a structure unit (b) derived from a carboxyl group-containing monomer (B) at specific ratios.