The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Jun. 13, 2008
Sushil Kumar, New Delhi, IN;
Prakash Narain Dixit, New Delhi, IN;
Chandra Mohan Singh Rauthan, New Delhi, IN;
Sushil Kumar, New Delhi, IN;
Prakash Narain Dixit, New Delhi, IN;
Chandra Mohan Singh Rauthan, New Delhi, IN;
Council of Scientific & Industrial Research, New Delhi, IN;
Abstract
A process for the preparation of nano structured silicon thin film using radio frequency (rf) plasma discharge useful for light emitting devices such as light emitting diode, laser etc. which allows precise control of the nanocrystal size of silicon and its uniform distribution without doping using a plasma processing for obtaining efficient photoluminescence at room temperature.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile