The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Aug. 06, 2009
Yasuomi Kaneuchi, Yokohama, JP;
Motoki Kakui, Yokohama, JP;
Kazuo Nakamae, Yokohama, JP;
Shinobu Tamaoki, Yokohama, JP;
Yasuomi Kaneuchi, Yokohama, JP;
Motoki Kakui, Yokohama, JP;
Kazuo Nakamae, Yokohama, JP;
Shinobu Tamaoki, Yokohama, JP;
Sumitomo Electric Industries, Ltd., Osaka-shi, JP;
Abstract
The present invention relates to a laser marking method which is capable of changing the grey level of a marking even in the case of a high processing speed. The laser marking method forms a marking pattern on a marking object by irradiating the marking object with pulsed light oscillated from a pulsed light source of a MOPA structure in which a semiconductor laser outputting directly-modulated pulsed light is used as a seed light source. At this time, the pulse duration of the pulsed light is changed in order to change a gray level of the marking pattern to be formed. In this way, a peak power of the pulsed light is changed by changing the pulse duration, so that it is possible to positively change the gray level of the marking pattern without changing the processing speed.