The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Nov. 09, 2009
Applicants:
Xiaoping Bian, Saratoga, CA (US);
Jack Jyh-kau Chang, Freemont, CA (US);
Zhupei Shi, San Jose, CA (US);
Inventors:
Xiaoping Bian, Saratoga, CA (US);
Jack Jyh-Kau Chang, Freemont, CA (US);
Zhupei Shi, San Jose, CA (US);
Assignee:
HGST Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/66 (2006.01); G11B 5/65 (2006.01); G11B 5/73 (2006.01); G11B 5/738 (2006.01);
U.S. Cl.
CPC ...
G11B 5/66 (2013.01); G11B 5/65 (2013.01); G11B 5/7325 (2013.01); G11B 5/738 (2013.01);
Abstract
Perpendicular magnetic recording (PMR) media and methods of fabricating PMR media are described. The PMR media includes, among other layers, an underlayer, a first onset layer on the underlayer, a second onset layer on the first onset layer, and a perpendicular magnetic recording layer on the second onset layer. The second onset layer has a magnetic moment which is higher than both a magnetic moment of the first onset layer and a magnetic moment of the perpendicular magnetic recording layer.