The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Dec. 16, 2008
Samuel S. Mao, Castro Valley, CA (US);
Costas P. Grigoropoulos, Berkeley, CA (US);
David J. Hwang, El Cerrito, CA (US);
Andrew M. Minor, El Cerrito, CA (US);
Samuel S. Mao, Castro Valley, CA (US);
Costas P. Grigoropoulos, Berkeley, CA (US);
David J. Hwang, El Cerrito, CA (US);
Andrew M. Minor, El Cerrito, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.