The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Feb. 28, 2009
Applicants:
Emmanuel Ossei-wusu, Kiel, DE;
Ala Cojocaru, Kiel, DE;
Juergen Carstensen, Kiel, DE;
Helmut Foell, Moenkeberg, DE;
Inventors:
Emmanuel Ossei-Wusu, Kiel, DE;
Ala Cojocaru, Kiel, DE;
Juergen Carstensen, Kiel, DE;
Helmut Foell, Moenkeberg, DE;
Assignee:
Christian-Albrechts-Universitaet zu Kiel, Kiel, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
Method for the electrochemical etching of macropores in n-type silicon wafers, using illumination of the wafer reverse sides and using an aqueous electrolyte, characterized in that the electrolyte is an aqueous acetic acid solution with the composition of HO:CHCOOH in the range between 2:1 and 7:3, with an addition of at least 9 percent by weight hydrofluoric acid.