The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Sep. 15, 2011
Ido Omer, Seattle, WA (US);
Eyal Ofek, Redmond, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
A digital image is divided into patches of pixels, or 'superpixels', where each of the pixels in the patch has approximately the same color value and each of the patches is of approximately the same size. Subsequently, eigenvalues are generated for each patch based on the color values of the individual pixels in the patch, as expressed in a multidimensional color-space. A ratio between the first largest eigenvalue and the second largest eigenvalue for each patch is determined and is then, subsequently, normalized, either based on the intensity of the corresponding patch or normalized to a range between zero and one. The resulting values are compared to a threshold to identify those regions of the digital image that are deemed to be in shadow, thereby generating a shadow mask for the digital image, or are weighted to generate a shadow probability mask.