The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2013

Filed:

Aug. 05, 2011
Applicants:

Alexandru S. Biris, Little Rock, AR (US);

Abhijit Biswas, Norman, OK (US);

Ilker S. Bayer, Champaign, IL (US);

Lloyd A. Bumm, Norman, OK (US);

Inventors:

Alexandru S. Biris, Little Rock, AR (US);

Abhijit Biswas, Norman, OK (US);

Ilker S. Bayer, Champaign, IL (US);

Lloyd A. Bumm, Norman, OK (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating a surface enhanced Raman scattering (SERS) substrate. In one embodiment, the method has the steps of simultaneously evaporating a metal at a first evaporation rate and a polymer at a second evaporation rate different from the first evaporation rate, to form a nanocomposite of the metal and the polymer, depositing the nanocomposite onto a substrate, and applying an etching process to the deposited nanocomposite on the substrate to remove the polymer material, thereby forming an SERS substrate.


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