The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Oct. 19, 2009
Emanuel Marom, Tel Aviv, IL;
Eyal Ben-eliezer, Kiryat Ono, IL;
Naim Konforti, Holon, IL;
Benjamin Milgrom, Netanya, IL;
Emanuel Marom, Tel Aviv, IL;
Eyal Ben-Eliezer, Kiryat Ono, IL;
Naim Konforti, Holon, IL;
Benjamin Milgrom, Netanya, IL;
RAMOT at Tel Aviv University Ltd., Tel Aviv, IL;
Abstract
A method for designing a mask, the method includes: choosing or receiving a desired contrast value; and determining sizes, locations and shapes of multiple rotationally symmetric regions of a mask such as to define a modulation transfer function that is characterized by a substantially uniform response over a spatial frequency range; wherein the uniform response is substantially indifferent to an orientation of features of the object and to a location of the object within a deep depth-of-field region. An optical imaging system that includes: a mask that includes multiple rotationally regions; wherein the multiple rotationally symmetric regions are shaped and positioned such as to define a modulation transfer function that is characterized by a substantially uniform response over a spatial frequency range, wherein the uniform response is substantially indifferent to an orientation of features of the object and to a location of the object within a deep depth-of-field region.