The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Jan. 12, 2012
Se-hwan Yu, Seoul, KR;
Chong-sup Chang, Hwaseong-si, KR;
Sang-ho Park, Suwon-si, KR;
Ji-seon Lee, Suwon-si, KR;
Se-Hwan Yu, Seoul, KR;
Chong-Sup Chang, Hwaseong-si, KR;
Sang-Ho Park, Suwon-si, KR;
Ji-Seon Lee, Suwon-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
A method is provided for forming a fine pattern. In the method, a first fine pattern and a first metal pattern are formed by respectively patterning a first fine pattern layer on a base substrate and a first metal layer on the first fine pattern layer. A second fine pattern layer and a second metal layer are sequentially formed over the first fine pattern and the first metal pattern. The second metal layer is patterned, so that a second metal pattern between adjacent portions of the first fine pattern. The second fine pattern layer is patterned using the second metal pattern as a mask, so that a second fine pattern is formed between adjacent portions of the first fine pattern.