The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Apr. 09, 2009
Jerome Ballet, Charenton-le-Pont, FR;
Claudine Biver, Charenton-le-Pont, FR;
Jean-paul Cano, Charenton-le-Pont, FR;
Florent Deliane, Montpellier Cedex, FR;
Pascal Etienne, Montpellier Cedex, FR;
Marjorie Llosa, Charenton-le-Pont, FR;
Jerome Ballet, Charenton-le-Pont, FR;
Claudine Biver, Charenton-le-Pont, FR;
Jean-Paul Cano, Charenton-le-Pont, FR;
Florent Deliane, Montpellier Cedex, FR;
Pascal Etienne, Montpellier Cedex, FR;
Marjorie Llosa, Charenton-le-Pont, FR;
Essilor International (Compagnie Generale d'optique), Charenton-le-Pont, FR;
Centre National de la Recherche Scientifique-CNRS, Paris Cedex, FR;
Abstract
The invention relates to a photo-crosslinkable composition obtainable by a method comprising: (a) the hydrolysis and condensation reaction of a [(epoxycycloalkyl)alkyl]trialkoxysilane in solution in an organo-aqueous medium as described in specification to obtain a solution of an organo-mineral hybrid prepolymer, in which the totality or quasi-totality of the alkoxysilane groups has been hydrolysed, and which comprises in average at least 4 (epoxycycloalkyl)alkyl groups; (b) cooling the obtained polyepoxide prepolymer composition as described in specification: (c) adding to said composition at least one cationic-polymerisation photo-photoinitiator and at least one specific photosensitiser as describes in specification and adding a surfactant; (d) agitating the obtained composition as described in specification thus obtained; (e) filtering the obtained composition as described in specification thus obtained; and (f) storing the obtained liquid filtrate as described in specification thus obtained. The invention also relates to the a photocrosslinkable composition as a negative photosensitive resin in a photolithography process.