The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
May. 18, 2011
Applicants:
Jong Kwang Lee, Daejeon Metropolitan, KR;
Jin Ho Ju, Seoul, KR;
Min Kang, Seoul, KR;
Hyang-shik Kong, Seongnam-si, KR;
Inventors:
Jong Kwang Lee, Daejeon Metropolitan, KR;
Jin Ho Ju, Seoul, KR;
Min Kang, Seoul, KR;
Hyang-Shik Kong, Seongnam-si, KR;
Assignee:
Samsung Display Co., Ltd., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract
A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.