The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Apr. 16, 2012
Applicants:
Juergen Erwin Lang, Karlsruhe, DE;
Rainer Nicolai, Basel, CH;
Hartwig Rauleder, Rheinfelden, DE;
Inventors:
Assignee:
Evonik Degussa GmbH, Essen, DE;
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A reactor and a plant containing the reactor for conducting a continuous, industrial process for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride is provided. The plant contains a plasma reactor having a dielectric, a high voltage electrode and an earthed, metallic heat exchanger, in which the longitudinal axes of the dielectric, of the high-voltage electrode and of the earthed, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.