The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Nov. 20, 2008
Toshinori Miura, Yaizu, JP;
Toshinori Miura, Yaizu, JP;
Meidensha Corporation, Tokyo, JP;
Abstract
A method for removing a resist on a substrate includes supplying unsaturated hydrocarbon gas or fluorine substitution product gas of unsaturated hydrocarbon, at a lower pressure than an atmospheric pressure, to a system of reaction capable of heating the substrate and supplying ozone gas at a lower pressure than the atmospheric pressure to the system of reaction. The ozone gas is an ultra-high concentration ozone gas obtained by separating only ozone from ozone-containing gas by a difference of vapor pressure through liquefaction separation and by vaporizing a liquefaction-separated ozone again. The substrate may be cleaned with pure water. A susceptor that holds the substrate is provided in a chamber of the system of reaction and is heated by a light source that emits infrared light. An internal pressure of the chamber is controlled so that a temperature of the substrate is 90° C. or less.