The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Mar. 01, 2010
Chang Bok Yi, Fremont, CA (US);
Tatsuru Tanaka, Campbell, CA (US);
Chun Wai Joseph Tong, San Jose, CA (US);
Hongling Liu, Sunnyvale, CA (US);
Paul S. Mcleod, Berkeley, CA (US);
Chang Bok Yi, Fremont, CA (US);
Tatsuru Tanaka, Campbell, CA (US);
Chun Wai Joseph Tong, San Jose, CA (US);
Hongling Liu, Sunnyvale, CA (US);
Paul S. McLeod, Berkeley, CA (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
Methods and apparatus are provided for static-biasing a pre-metalized non-conductive substrate within a process chamber. A substrate holder that holds a pre-metalized non-conductive substrate is engaged by a lift mechanism that provides movement of the substrate in a first, upward direction to a contact position within the process chamber and in a second direction to a non-contact position. When the substrate holder is moved to the contact position, the substrate electrically engages a conductive spring-loaded compliance mechanism that is mounted in a fixed position within the process chamber. The spring-loaded compliance mechanism is connected to a bias-voltage feed-through for the process chamber that applies a bias voltage to the substrate via the spring-loaded compliance mechanism.