The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2013

Filed:

May. 20, 2013
Applicant:

E.i. Du Pont DE Nemours and Company, Wilmington, DE (US);

Inventors:

Mark A Hackler, Ocean, NJ (US);

Anandkumar R Kannurpatti, Glen Mills, PA (US);

Robert A McMillen, Downingtown, PA (US);

Todd M Scheske, Rochester, NY (US);

Assignee:

E I du Pont de Nemours and Company, Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.


Find Patent Forward Citations

Loading…