The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Jan. 28, 2009
Applicants:

Jian Chen, Cambridge, MA (US);

Andy Eow, Brooklyn, NY (US);

Xiaoxu MA, Sunnyvale, CA (US);

Inventors:

Jian Chen, Cambridge, MA (US);

Andy Eow, Brooklyn, NY (US);

Xiaoxu Ma, Sunnyvale, CA (US);

Assignee:

NetVirta, LLC, Norwell, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/10 (2011.01);
U.S. Cl.
CPC ...
Abstract

Techniques which employ structure-from-motion modeling techniques to produce 3-D models of any desired accuracy of any surface I the techniques, a pattern is applied to the surface to be modeled The pattern includes elements which are unique within the pattern as applied to the surface and which have a density in the pattern such that when two-dimensional images are made of the surface, correlatable features having the density required for the desired accuracy may be extracted from the two dimensional images In one example of the techniques, a consumer may make the images required to produce a model of his or her body by donning a garment with a pattern having the necessary uniqueness and density, and then using any digital camera to take pictures of their body wearing the garment The model may then be produced from the pictures.


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