The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Feb. 15, 2011
Applicants:

Eyal Ben-eliezer, Kiryat Ono, IL;

Emanuel Marom, Tel Aviv, IL;

Naim Konforti, Holon, IL;

Zeev Zalevsky, Rosh Ha'ayin, IL;

Inventors:

Eyal Ben-Eliezer, Kiryat Ono, IL;

Emanuel Marom, Tel Aviv, IL;

Naim Konforti, Holon, IL;

Zeev Zalevsky, Rosh Ha'ayin, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.


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