The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Jun. 17, 2010
Applicants:

Andreas Rose, Langenfeld, DE;

Martin Gotter, Köln, DE;

Thomas Schwindack, League City, TX (US);

Christoph Schwinning, Leverkusen, DE;

Patrick Eckert, Kandern, DE;

Holm Kändler, Auggen, DE;

Christof-krzysztof Koltunski, Merzhausen, DE;

Hannes Ebding, Haltingen, DE;

Inventors:

Andreas Rose, Langenfeld, DE;

Martin Gotter, Köln, DE;

Thomas Schwindack, League City, TX (US);

Christoph Schwinning, Leverkusen, DE;

Patrick Eckert, Kandern, DE;

Holm Kändler, Auggen, DE;

Christof-Krzysztof Koltunski, Merzhausen, DE;

Hannes Ebding, Haltingen, DE;

Assignee:

Bayer MaterialScience AG, Leverkusen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/28 (2006.01); G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A probe for monitoring a pressurised process space includes a casing enclosing a cavity and having a first window configured to be brought into contact with the process space, and a second window. A sealing means is configured to seal the first window to the casing. At least once coupling line is disposed within the cavity between the first and second windows and is configured to guide electromagnetic radiation entering through one of the two windows to the other of the two windows. A method for monitoring a pressurised process space, in which one or more hazardous substances occur, is also disclosed.


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