The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Dec. 15, 2011
Satoshi Tomimatsu, Kokubunji, JP;
Kaoru Umemura, Musashino, JP;
Yuichi Madokoro, Kokubunji, JP;
Yoshimi Kawanami, Kokubunji, JP;
Yasunori Doi, Kokubunji, JP;
Satoshi Tomimatsu, Kokubunji, JP;
Kaoru Umemura, Musashino, JP;
Yuichi Madokoro, Kokubunji, JP;
Yoshimi Kawanami, Kokubunji, JP;
Yasunori Doi, Kokubunji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication by a focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen extracted from the specimen by the focused ion-beam fabrication method, to the sample holder; and a sample chamber in which the sample, the sample holder and the probe are laid out, wherein, in the sample chamber, the micro-specimen extracted from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of the sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam.