The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Feb. 18, 2009
Majung Park, Chiba, JP;
Manabu Oumi, Chiba, JP;
Majung Park, Chiba, JP;
Manabu Oumi, Chiba, JP;
Seiko Instruments Inc., , JP;
Abstract
A manufacturing method of a tip type probe includes the steps of: forming on a substrate an etching mask of a shape similar to a shape of a top surface of a truncated pyramid; forming the truncated pyramid by subjecting the substrate to isotropic etching using the etching mask as a mask member; stopping the isotropic etching when an area of the top surface reaches an area capable of generating near-field light; and forming a metal film on at least some of the side surfaces of the truncated pyramid by allowing film forming particles to enter into a space between the etching mask and the side surfaces and adhere onto the truncated pyramid. The directivity of the film forming particles is controlled so that the metal film has a thickness that is reduced gradually from a bottom of the truncated pyramid toward the top surface.