The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Dec. 13, 2010
Applicants:

Tetsuya Tanaka, Yamanashi, JP;

Kunihiko Tokita, Yamanashi, JP;

Inventors:

Tetsuya Tanaka, Yamanashi, JP;

Kunihiko Tokita, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

It is an objective to provide a screen print system and a method for cleaning a mask of the screen print system that enable sufficient cleaning of the mask used for subjecting a cavity substrate to screen printing. A screen print system includes a first cleaning unitand a second cleaning unit. The first cleaning unitsequentially brings a mask contact area R, which is formed by stretching a paper memberover an upper end of a nozzle part, into contact with lower surfaces of respective convex portionsof a first mask, thereby removing paste Pst adhering to the respective lower surfaces of the respective convex portions. The second cleaning unitbrings the mask contact area R, which is formed by stretching the paper memberover the upper end of the nozzle part, into contact with a lower surface of a second mask, thereby removing the paste Pst adhering to the lower surface of the second mask. The first cleaning unitwinds up the paper memberwhile removing the paste Pst adhering to the lower surfaces of the convex portionsof the first mask


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