The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Mar. 09, 2012
Oscar Chi Lim AU, Hong Kong, CN;
Ling Hou, Hong Kong, CN;
Oscar Chi Lim Au, Hong Kong, CN;
Ling Hou, Hong Kong, CN;
Kiu Sha Management Limited Liability Company, Wilmington, DE (US);
Abstract
The claimed subject matter relates to an architecture that can facilitate more efficient free view generation in Ray-Space by way of a Radon transform. The architecture can render virtual views based upon original image data by employing Ray-Space interpolation techniques. In particular, the architecture can apply the Radon transform to a feature epipolar plane image (FEPI) to extract more suitable slope or direction candidates. In addition, the architecture can facilitate improved block-based matching techniques in order to determine an optimal linear interpretation direction.