The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Feb. 17, 2011
Masanori Sakamoto, Hamura, JP;
Masanori Sakamoto, Hamura, JP;
Casio Computer Co., Ltd., Tokyo, JP;
Abstract
A method of detecting a contact state includes measuring first, second, third and fourth potentials. The method further includes deriving distance information between two points when a first resistive film contacts a second resistive film at the two points, based on the first, second, third and fourth potentials. The first, second, third and fourth potentials are potentials at fourth, second, third and fourth end regions, respectively, in first, second, third and fourth states, respectively. A first end region is an end region, as viewed in a first direction, and the second end region is an end region opposite to the first end region of the first resistive film. The third end region is an end region, as viewed in a second direction, and the fourth end region is an end region opposite to the third end region of the second resistive film.