The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Oct. 27, 2010
Robert Aaron Falk, Newcastle, WA (US);
Robert Aaron Falk, Newcastle, WA (US);
Quantum Focus Instruments Corporation, Vista, CA (US);
Abstract
Methods and apparatus for producing sub-diffraction limited images utilizing an exponential scaling effect. An exemplary system provides an optical source that focuses an optical beam onto a target. The focused optical beam has sufficient optical intensity to induce an exponential signal response within the target. A detection device detects the exponential signal response. A scanning device scans the focused optical source and another device records the detection of the exponential signal response for purposes of producing a sub-diffraction limited image. The system further includes a display device that displays at least a portion of the recorded detection.