The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Sep. 29, 2009
Andreas Teppe, Alzenau, DE;
Berthold Schum, Biebergemund, DE;
Dieter Franke, Vaals, NL;
Ingo Schwirtlich, Miltenberg, DE;
Knut Vaas, Alzenau, DE;
Wilfried Schmidt, Schwaigern, DE;
Andreas Teppe, Alzenau, DE;
Berthold Schum, Biebergemund, DE;
Dieter Franke, Vaals, NL;
Ingo Schwirtlich, Miltenberg, DE;
Knut Vaas, Alzenau, DE;
Wilfried Schmidt, Schwaigern, DE;
Schott Solar AG, Mainz, DE;
Abstract
A method for chemically treating a disc-shaped substrate having a bottom surface, a top surface and side surfaces by contacting a process medium that is fluid-chemically active with at least the bottom surface of the substrate. The substrate is moved relative to the process medium while forming a triple line between the substrate, the substrate medium and the atmosphere surrounding the substrate and medium. In order to chemically remove errors, particularly in the side surfaces, relative motion should be carried out while avoiding a contacting of the process medium with the top surface of the substrate, where the triple line is formed at a desired height of the side surface facing away from the process medium flow side in relation to the relative motion between the substrate and the process medium.