The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Oct. 14, 2009
Thomas G. Mason, Los Angeles, CA (US);
Thomas G. Mason, Los Angeles, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A method for producing particles includes providing a first patterned surface having a first surface relief pattern adapted to impart structure to a plurality of particles while they are under production; providing a second patterned surface having a second surface relief pattern adapted to impart structure to a plurality of particles while they are under production; depositing a particle material in contact with at least one of the first patterned surface and the second patterned surface; aligning the first surface relief pattern on the first patterned surface with respect to the second surface relief pattern on the second patterned surface; contacting at least a portion of the first patterned surface with at least a portion of the second patterned surface; solidifying at least a portion of the particle material to form a plurality of particles; and separating at least a portion of the plurality of particles from at least one of the first patterned surface and the second patterned surface. The at least a portion of a structure of each of the plurality of particles is imparted by a combination of the first surface relief pattern and the second surface relief pattern.