The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
May. 20, 2012
Jeffrey E. Leclaire, Boca Raton, FL (US);
Kenneth G. Roessler, Boca Raton, FL (US);
David Brinkley, Baltimore, MD (US);
Jeffrey E. LeClaire, Boca Raton, FL (US);
Kenneth G. Roessler, Boca Raton, FL (US);
David Brinkley, Baltimore, MD (US);
Rave LLC, Delray Beach, FL (US);
Abstract
A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.