The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Oct. 19, 2010
Jared Ahmad Lee, Santa Clara, CA (US);
Martin Jeff Salinas, San Jose, CA (US);
Ankur Agarwal, Mountain View, CA (US);
Ezra Robert Gold, Sunnyvale, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Aniruddha Pal, Santa Clara, CA (US);
Andrew Nguyen, San Jose, CA (US);
Jared Ahmad Lee, Santa Clara, CA (US);
Martin Jeff Salinas, San Jose, CA (US);
Ankur Agarwal, Mountain View, CA (US);
Ezra Robert Gold, Sunnyvale, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Aniruddha Pal, Santa Clara, CA (US);
Andrew Nguyen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.