The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2013

Filed:

Jul. 16, 2010
Applicants:

Flavio Poehlmann-martins, Mountian View, CA (US);

Mark A. Cappelli, Sunnyvale, CA (US);

Gregory Rieker, Palo Alto, CA (US);

Inventors:

Flavio Poehlmann-Martins, Mountian View, CA (US);

Mark A. Cappelli, Sunnyvale, CA (US);

Gregory Rieker, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Accelerated charged particles are provided by inductive amplification of particle energy in connection with a deflagration-mode plasma discharge. The deflagration mode discharge tends to increase particle energy relative to other operating modes. Inductive amplification of particle energy further increases output particle velocity. Inductive amplification can occur by formation of a current loop in the plasma discharge, and/or by a sudden increase in inductance due to collapse of the current distribution of the plasma discharge. Applications include particle therapy and production of radio-isotopes.


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