The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Dec. 21, 2012
Applicant:
Institut National DE LA Recherche Scientifique, Quebec, CA (US);
Inventors:
Stephane Payeur, Montreal, CA;
Sylvain Fourmaux, Montreal, CA;
Jean-Claude Kieffer, Montreal, CA;
Michel Piche, Quebec, CA;
Jean-Philippe MacLean, Saint-Lambert, CA;
Christopher Tchervenkov, Brossard, CA;
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21G 4/00 (2006.01);
U.S. Cl.
CPC ...
G21G 4/00 (2013.01);
Abstract
A method for generating an ultrashort charged particle beam, comprising creating a high intensity longitudinal E-field by shaping and tightly focusing, in an on-axis geometry, a substantially radially polarized laser beam, and using the high intensity longitudinal E-field for interaction with a medium to accelerate charged particles.