The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2013

Filed:

Apr. 29, 2011
Applicants:

Krishna S. Bajjuri, San Jose, CA (US);

Qiu Dai, Sunnyvale, CA (US);

Alshakim Nelson, Campbell, CA (US);

Jitendra S. Rathore, Fremont, CA (US);

Inventors:

Krishna S. Bajjuri, San Jose, CA (US);

Qiu Dai, Sunnyvale, CA (US);

Alshakim Nelson, Campbell, CA (US);

Jitendra S. Rathore, Fremont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.


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