The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Sep. 24, 2008
Yasushi Matsumura, Tokyo, JP;
Masataka Takagi, Tokyo, JP;
Yasushi Matsumura, Tokyo, JP;
Masataka Takagi, Tokyo, JP;
Fujibo Holdings Inc., Tokyo, JP;
Abstract
A polishing pad which suppresses occurrence of a scratch or a roll-off on an object to be polished so that flatness is improved is provided. A polishing padis comprised a polyurethane sheethaving a polishing surface P for performing polishing processing to an object to be polished and an elastic sheethaving elasticity joined on a surface of the polyurethane sheeton the opposite side to the polishing surface P. The polyurethane sheetis set higher in compressibility than the elastic sheet, and is set lower in A hardness than the elastic sheet. The elastic sheetis set at 1% or more in compressibility, and is set at 90 degrees or less in A hardness. Further, both of the polyurethane sheetand the elastic sheetare formed to have a thickness of 0.2 mm or more. The flexibility of the polyurethane sheetis exerted during polishing processing so that the polyurethane sheetdeforms to press the polishing surface P approximately evenly on the object to be polished.