The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Apr. 23, 2008
Shu Yang, Blue Bell, PA (US);
Ying Zhang, Corning, NY (US);
Randall Kamien, Philadelphia, PA (US);
James Makoto Kikkawa, Swarthmore, PA (US);
Elisabetta Matsumoto, Kensington, CA (US);
Dinesh Chandra, Amherst, MA (US);
Shu Yang, Blue Bell, PA (US);
Ying Zhang, Corning, NY (US);
Randall Kamien, Philadelphia, PA (US);
James Makoto Kikkawa, Swarthmore, PA (US);
Elisabetta Matsumoto, Kensington, CA (US);
Dinesh Chandra, Amherst, MA (US);
The Trustees Of The University Of Pennsylvania, Philadelphia, PA (US);
Abstract
Aspects of the present invention describe soft imprint lithography methods capable of preparing structural features on surfaces. Disclosed methods include surmounting a deformable substrate, having an original form, with a composition, wherein the deformable substrate is capable of achieving at least one predetermined deformed state; predictably deforming said deformable substrate from its original form to the at least one predetermined deformed state; and transferring at least a portion of the composition surmounting the deformed substrate to a receiving substrate.