The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Sep. 18, 2008
Andreas Langner, Freigericht, DE;
Thomas Kayser, Leipzig, DE;
Gerhard Schoetz, Aschaffenburg, DE;
Mario Such, Graefenhainichen, DE;
Johannes Kirchhof, Jena, DE;
Stephan Grimm, Jena, DE;
Volker Reichel, Jena, DE;
Andreas Langner, Freigericht, DE;
Thomas Kayser, Leipzig, DE;
Gerhard Schoetz, Aschaffenburg, DE;
Mario Such, Graefenhainichen, DE;
Johannes Kirchhof, Jena, DE;
Stephan Grimm, Jena, DE;
Volker Reichel, Jena, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Institut fur Photonische Technologien, Jena, DE;
Abstract
The invention relates to a method allowing cost-effective production of doped quartz glass, particularly laser-active quartz glass, that is improved with regard to the homogeneity of the doping material distribution, in that a suspension is provided comprising SiOparticles and an initial compound for at least one doping material in an aqueous fluid, the fluid being removed under formation of a doped intermediate product comprising particles of the doping material or particles of the precursor substance or the doping material, and the doped quartz glass is formed by sintering the doped intermediate product, wherein at least part of the particles of the doping material or the particles of the precursor substance of the same is generated in the suspension as a precipitate of a pH-value-controlled precipitation reaction of the initial compound.