The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Dec. 08, 2009
Young Tae Cho, Suwon-si, KR;
Suk Won Lee, Yongin-si, KR;
Sin Kwon, Suwon-si, KR;
Jung Woo Seo, Hwaseong-si, KR;
Jeong Gil Kim, Suwon-si, KR;
Young Tae Cho, Suwon-si, KR;
Suk Won Lee, Yongin-si, KR;
Sin Kwon, Suwon-si, KR;
Jung Woo Seo, Hwaseong-si, KR;
Jeong Gil Kim, Suwon-si, KR;
Samsumg Electronics Co., Ltd., Gyeonggi-Do, KR;
Abstract
In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.