The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Feb. 04, 2011
Christopher Heinz Clifford, San Francisco, CA (US);
Christopher Heinz Clifford, San Francisco, CA (US);
Luminescent Technologies, Inc., Palo Alto, CA (US);
Abstract
During a calculation technique, contributions to reflected light from multiple discrete cells in a model of a multilayer stack in a reflective photo-mask may be determined based on angles of incidence of light in a light pattern to the multilayer stack, a polarization of the light in the light pattern, and a varying intensity of the light in the light pattern through the multilayer stack. Then, phase values of the contributions to the reflected light from the multiple discrete cells are adjusted, thereby specifying optical path differences between the multiple discrete cells in the multilayer stack that are associated with the defect. Moreover, the contributions to the reflected light from multiple discrete cells are combined to determine the reflected light from the multilayer stack. Next, k-space representations of the contributions to the reflected light from the multiple discrete cells are selectively shifted based on the angles of incidence.