The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Mar. 16, 2012
Yoko Takekawa, Tokyo, JP;
Yoko Takekawa, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
Described herein are methods and systems for efficiently preparing a wafer layout for processing into a photomask. Portions of layouts containing semiconductor features and designs that are frequently used can be stored in a database. These portions can be post-decomposition, with all treatment and error checking already performed upon them. When a wafer layout is received for processing into a photomask, the processing and decomposition time can be reduced by analyzing the layout, and replacing sections of the layout with the portions from the database that have already been decomposed and processed. As these sections no longer need to be decomposed, error checked, and treated, the processing time is greatly reduced, and photomasks can be made quicker and more efficiently.