The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Feb. 04, 2011
NO Young Chung, WhaSung, KR;
No Young Chung, WhaSung, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method for forming a circuit layout comprises performing process proximity effect modeling based on process proximity effects caused by a sub-layer, wherein the sub-layer comprises an active layer positioned under a gate poly, and wherein performing the process proximity effect modeling includes calculating a pattern density of the sub-layer, incorporating results of the process proximity effect modeling into a modeling algorithm, and performing proximity correction using the results to manipulate a layout of a mask to be used when forming the circuit layout by photolithography.
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