The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2013

Filed:

Feb. 12, 2011
Applicants:

Yonpyo Hon, Yamanashi, JP;

Kenzo Ebihara, Yamanashi, JP;

Masayuki Hamura, Yamanashi, JP;

Inventors:

Yonpyo Hon, Yamanashi, JP;

Kenzo Ebihara, Yamanashi, JP;

Masayuki Hamura, Yamanashi, JP;

Assignee:

Fanuc Corporation, Yamanashi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01);
U.S. Cl.
CPC ...
Abstract

A measurement program is created for measurement performed by moving X- and Z-axes so that a central axis of a probe is perpendicular to the surface of a reference sphere, and errors are obtained between original probe position data and probe position data obtained by measurement performed at two different angles θand θof a rotary axis according to the created measurement program. Position coordinates of a tip end of the probe at the two different angles θand θof the rotary axis are corrected so that the errors are zero. Then, the X- and Z-axis coordinates are corrected based on a positive or negative phased shift amount, and measurement errors are obtained by calculation. A real probe tip position is defined by the X- and Z-axis coordinates corrected by a correction amount with which the obtained measurement errors become minimum.


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