The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Oct. 01, 2012
Trumpf Laser Marking Systems Ag, Gruesch, CH;
Trumpf Laser Marking Systems AG, Gruesch, CH;
Abstract
A system includes: a first nonlinear crystal arranged to receive to a first laser beam having a first wavelength λand operable to generate, by frequency doubling of the first laser beam, a second laser beam having a second wavelength λ, in which the second beam propagates collinearly with the first beam; a second nonlinear crystal arranged to receive the first and second laser beams from the first crystal, in which the second crystal is operable to generate, by frequency mixing of the first and second laser beams, a third laser beam having a third wavelength λ; and one or more lenses between the first and second crystals, in which the one or more lenses are operable to spatially separate the first and second beams. The first and second laser beams propagate at an offset and/or titled with respect to an optical axis in order to cause the spatial separation.