The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Oct. 04, 2010
Uwe Albertin, Houston, TX (US);
Ole Joran Askim, Trondheim, NO;
Mariana Gherasim, Houston, TX (US);
BP Corporation North America Inc., Houston, TX (US);
Abstract
According to a preferred aspect of the instant invention, there is provided herein a system and method for extending zero-offset or stacked wave-equation illumination analysis into the angle-gather domain, where it becomes an appropriate tool for assessing the effects of complex overburden on AVA response. A preferred method for doing this involves first creating an angle gather that has a perfect AVA response (i.e. a constant amplitude as a function of angle). This gather is then preferably used as a reflectivity map that is fed into a demigration process which creates modeled data that by construction carries with it a completely flat reflectivity signature. Remigration of such a data set then results in a gather on which any amplitude variation is more likely to be a measure of illumination effects alone. The resulting AVA signature on the gather can then be used to assess the validity of the AVA response on modeled or actual data, resulting in a useful AVA risk analysis.